The University of Tennessee

METROLOGY AND LITHOGRAPHY GROUP

              Welcome to the Home Page of the University of Tennessee Metrology and Lithography Group.
      We are developing techniques for the metrology and imaging of semiconductor devices using electron-beam
        tools. As part of this effort we have developed databases and Monte Carlo simulations that we hope may
        be of use to your work  as well. Feel free to download and share these items. You may contact us at
        djoy@utk.edu. We thank the SRC for their support of this work.

Downloads:

Download SMART -  a program to measure SEM image resolution and performance. SMART is a macro which works with NIH Image and SCION Image. The files are as follows:

• SMART          macro
• Help                a powerpoint stack with complete instructions on using SMART        
• "Metrics of SEM Performance" [doc]  [pdf] a copy of the paper by Joy, Ko and Hwu  about  SMART presented at SPIE. (Paper published with the permission of SPIE).

• Electron-Solid Interaction Database  - A complete collection of experimental data on secondary electron and back scattered electron, yields, electron stopping power, x-ray ionization cross-section and x-ray fluorescent yields.
• Mott Scattering Cross-Sections   A complete set of Mott elastic cross-sections for energies  from 20 to 30 eV.
• Monte Carlo Simulations of electron-solid interactions for WIN 95.
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