Fabrication & Processing capabilities in Ramki Kalyanaraman's group

Please get in touch if you would like to use one of our capabilities

  1. We have the ability to deposit films of any material that can be obtained in solid state by e-beam evaporation and/or pulsed laser ablation. Also, we can deposite sequentially or simultaneously to achieve a variety of materials combinations. A vibration minimized UHV chamber with load-lock with s 30 port custom-designed stainless steel UHV vacuum chamber (manufactured by NorCal products) with base pressure of 2  ×  10-9 Torr is at the heart of our set-up. The chamber is bakeable to 250oC. Pumping is by Osaka Magnetically levitated turbomolecular pump model TH260MCA and Physical Electronics TiTan 400L Ion pump. The backing pump is a Leybold ECODRY-L oil-free pump. The vacuum system and all pumps (except the backing pump) are mounted on a custom-built mechanical isolation table with I-2000 isolation legs from Newport. The observed vibration amplitude on the substrate is less than ± 25 nm peak-to-peak. Sample introduction into the chamber is through a 6-port custom-cross load-lock, which is accessed by Thermionics QAD-450 quick access door. The sample is inserted into the main chamber via Thermionics model FLLRE-275 magnetically coupled rotary feed-through. Load-lock chamber is pumped by a Leybold D16B rotary pump and the TMP. A Varian multi-gauge controller model 835 monitors 4 T/C and 2 ionization gauges. It controls up to 7 gate valves for automated isolation and safe operation of the vacuum system. The gate valves are VAT Cu-gasket UHV valves or Nor-Cal gate valves and are pneumatically actuated by air pressure.
  2. Multiple-technique deposition capability and thickness monitoring/control: E-beam evaporation is by a Tectra-GMBH E-FLUX MINI e-beam source oriented for top-down deposition using rod sources. Ar+ ion beam sputtering is by Nonsequitor Model 1401 differentially pumped ion gun (1 cm2 beam size; 100 nA-10 mA beam current; 50 eV-2000 eV Energy). Up to four 0.5” targets may be rotated into place for multi-layered film deposition.This target holder was designed and built in the physics machine shop. It also serves as the target holder for laser ablation. Laser ablation is by a 266 nm Nd:YAG laser described later. In-situ thickness monitoring and control is via Inficon Model XTM/2P quartz crystal thickness monitor with bakeable sensor. The monitor can detect down to 0.01 Å/s deposition rates.
  3. Co-evaporation and sequential deposition capability of up to 4 different materials is available: E-beam evaporation by Mantis QUAD-EV-HP 4-pocket mini e-beam evaporator with co-evaporation capability. Other freatures include: Bakeable to 250oC. Software control of evaporation process for deposition of up to 4 different materials to create multilayered films as well as for co-evaporation to mix up to 4 different materials. Independent monitoring of deposition rate. Motor-driven shutter for control of multilayer and/or co- evaporation process Motor-driven drive mechanism allows automatic positioning either from the power supply or from software. Software-enabled flux control permits programmable evaporation sequences, and comprehensive data logging. Evaporation of materials includes high-vapor pressure materials, refractory metals, ceramics, and semiconductors.

Send us a message by email to ramki @ utk dot edu!

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